Compared to most “breakthrough” techniques, this one does sound like it could be implemented in somewhat realistic timeframes (i.e. within ~5 years).
It’s too early to say if this will result in cheaper or denser NAND chips for consumers. The technique still needs to be proven commercially viable and scaled for mass production. Even if manufacturers adopt the process, there’s no guarantee that any cost savings will trickle down to consumers.
It opens with
A new plasma-based etching process could lead to denser data storage in phones, cameras, and computers.
But they never explain how. The new technique just speeds up the etching process, I don’t get how that could lead to DENSER storage - just cheaper storage
Presumably, it would allow finer resolution than the photolithography etching techniques in common use.
Not arguing but why do you say presumably? I didn’t see anything about there being a finer point to the engraving
Because increasing the resolution to pack more components into the same area is the only way to increase their density.
Right, I get that. But does this etching technique increase resolution? I just read the article, not the study, but it only talks about the SPEED of etching, not the resolution
Ah, I read the article and I understand now.
They’re talking about 3d NAND flash, where density is increased by stacking memory cells vertically rather than packing them tighter horizontally. No increase in resolution is required, the increased etching speed means that they can build up a larger number of stacks without increasing the manufacturing time and its’ resulting costs per unit.
Though they also mention that this new technique results in “cleaner edges” on the etched features as well, so some minor resolution improvement would also be possible but it’s more likely to be kept at the same node to improve yields.
The density line is what really threw me off because the edge comment is the only thing even kind of hinting at it being possible. I guess we’ll wait and see!
